Presentations

    Impact of sputtering parameters on titanium dioxide thin films for nonlinear nanophotonics, at Photonics West 2011 (San Francisco, CA), Monday, January 24, 2011:
    We have identified titanium dioxide (TiO2) as a promising material for on-chip nonlinear optical devices. Its high refractive index and large intrinsic nonlinearity can strongly enhance confinement and non-linear interactions. In this study we optimize our deposition process to lower the linear losses in planar waveguides. We deposit titanium oxide thin films by RF reactive sputtering titanium onto oxidized silicon wafers in an argon/oxygen environment. The oxygen partial pressure in the chamber has a large impact on the deposition rate and the film composition. We investigate the composition... Read more about Impact of sputtering parameters on titanium dioxide thin films for nonlinear nanophotonics