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Fabrication of Micrometer-Sized Conical Field Emitters Using Femtosecond Laser-Assisted Etching of Silicon

Citation:

J. E. Carey, C. H. Crouch, R. J. Younkin, E. Mazur, M. A. Sheehy, and C. M. Friend. 2001. “Fabrication of Micrometer-Sized Conical Field Emitters Using Femtosecond Laser-Assisted Etching of Silicon.” In . International Vacuum Microelectronics Conference 2001.

Abstract:

Arrays of sharp, conical microstructures were obtained by structuring the surface of a silicon wafer using femtosecond laser-assisted etching. Analysis of the arrays shows high, stable field emission without any further processing steps and turn-on fields as low as 1.3 V/um