Citation:
B. R. Tull, J. E. Carey, E. Mazur, J. McDonald, and S. M. Yalisove. 2006. “Surface morphologies of silicon surfaces after femtosecond laser irradiation.” Mat. Res. Soc. Bull., 31, Pp. 626–633. Publisher's Version
Abstract:
In this article, we present summaries of the evolution of surface morphology resulting from the irradiation of single-crystal silicon with femtosecond laser pulses. In the first section, we discuss the development of micrometer-sized cones on a silicon surface irradiated with hundreds of femtosecond laser pulses in the presence of sulfur hexafluoride and other gases. We propose a general formation mechanism for the surface spikes. In the second section, we discuss the formation of blisters or bubbles at the interface between a thermal silicon oxide and a silicon surface after irradiation with one or more femtosecond laser pulses. We discuss the physical mechanism for blister formation and its potential use as channels in microfluidic devices.See also: Optical hyperdoping: black silicon