Optoelectronic devices using femtosecond laser microstructured silicon

Presentation Date: 

Sunday, June 12, 2005

Location: 

NATO ASI Course on New developments in optics and related fields: modern techniques, materials, and applications, Centro Ettore Majorana (Erice, Italy)

Presentation Slides: 

Arrays of sharp, conical microstructures are obtained by stucturing the surface of a silicon wafer using femtosecond laser-assisted chemical etching. The one step, maskless structuring process drastically changes the optical, material and electronic properties of the original silicon wafer. These properties make microstructured silicon viable for use in a wide range of commercial devices including solar cells, infrared photodetectors, chemical and biological sensors, and field emission devices.