Thursday, November 30, 2006
2006 MRS Fall Meetng (Boston, MA, USA)
In this work we present new resin formulations containing active components, that can be polymerized by two-photon absorption in order to fabricate microstructures. The host resin we used consists of tris(2-hydroxyethyl)isocyanurate triacrylate, which gives hardness to the polymeric structure, ethoxylated(6) trimethyl-lolpropane triacrylate, which assists in decreasing the structure shrinkage upon polymerization, and ethyl-2,4,6-trimethylbenzoylphenylphosphinate, which acts as the polymerization photoinitiator. As guest material we used the conjugated polymer MEH-PPV, whose interesting optical and electrical properties have attracted considerable attention.